The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 2024
Filed:
Jul. 14, 2020
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Abstract
A composition for forming a silicon-containing resist underlayer film includes: a thermosetting silicon-containing material containing any one or more of a partial structure shown by the general formula (Sx-1), (Sx-2), and (Sx-3); and a compound shown by the general formula (P-0), where Rrepresents an organic group that has or generates a silanol group, a hydroxy group, or a carboxy group; Rand Rare each independently the same as Ror each represent a hydrogen atom or a monovalent substituent having 1 to 30 carbon atoms; Rrepresents a divalent organic group substituted with a fluorine atom; Rand Reach independently represents a monovalent hydrocarbon group having 1 to 20 carbon atoms; Rrepresents a divalent hydrocarbon group having 1 to 20 carbon atoms; and Lrepresents a single bond or a divalent hydrocarbon group having 1 to 20 carbon atoms.