Martin O'Toole

Title: Martin O'Toole: Innovator in Multiple Patterning Technologies

Introduction

Martin O'Toole is a distinguished inventor based in Saratoga Springs, NY (US), known for his significant contributions to the field of semiconductor manufacturing. With a total of 8 patents to his name, O'Toole has made remarkable advancements in multiple patterning techniques that enhance the efficiency and precision of semiconductor fabrication.

Latest Patents

O'Toole's latest patents include innovative methods for self-aligned multiple patterning. One of his notable inventions involves a process where a hardmask is deposited over an interlayer dielectric layer. A mandrel is formed over the hardmask, and a block mask is created to cover a specific section of the mandrel while exposing others. This process allows for the definition of a pattern that includes mandrel lines separated by the block mask. The pattern is then transferred to the hardmask and subsequently to the interlayer dielectric layer through etching processes. Another patent focuses on methods involving lithographically-defined cuts, where conformal spacer layers are utilized to create trenches that expose portions of the hardmask, further refining the etching process.

Career Highlights

Throughout his career, Martin O'Toole has worked with prominent companies in the semiconductor industry, including GlobalFoundries Inc. and GlobalFoundries U.S. Inc. His work has been pivotal in advancing the technologies that underpin modern semiconductor manufacturing.

Collaborations

O'Toole has collaborated with notable professionals in his field, including Hsueh-Chung Chen and Terry Allen Spooner. These collaborations have contributed to the development of innovative solutions in semiconductor technology.

Conclusion

Martin O'Toole's contributions to multiple patterning technologies have significantly impacted the semiconductor industry. His innovative patents and collaborations reflect his commitment to advancing manufacturing processes.