Location History:
- Veldhoven, NL (2017)
- Eindhoven, NL (2014 - 2021)
Company Filing History:
Years Active: 2014-2021
Title: Unveiling the Innovations of Inventor Martijn Constant Van Beurden
Introduction: Martijn Constant Van Beurden, a distinguished inventor based in Eindhoven, NL, has made remarkable strides in the world of technology with his inventive solutions. With a portfolio boasting six patents, his contributions have significantly impacted the field of electromagnetic scattering properties and lithographic processes.
Latest Patents: One of Martijn Constant Van Beurden's recent patents involves methods and apparatus for calculating electromagnetic scattering properties of a structure and for the reconstruction of approximate structures. This innovative approach includes designing a preconditioner suitable for the input system and numerically solving a volume integral equation for electromagnetic scattering, enabling the accurate calculation of scattering properties.
Career Highlights: Martijn Constant Van Beurden is affiliated with ASML Netherlands B.V., a leading technology company known for its advancements in the semiconductor industry. His tenure at ASML Netherlands B.V. has provided him with a platform to drive innovation and develop cutting-edge solutions in the field of lithography and electromagnetic properties.
Collaborations: In his professional journey, Martijn has collaborated with experts in the field, including coworkers such as Irwan Dani Setija and Remco Dirks. Together, they have synergized their expertise to pioneer new approaches and technologies, fostering a culture of innovation and excellence within their workspace.
Conclusion: Inventor Martijn Constant Van Beurden's relentless pursuit of technological advancements and his commitment to pushing the boundaries of innovation have solidified his position as a prominent figure in the world of patents and inventions. His groundbreaking work continues to inspire and pave the way for future developments in the realm of electromagnetic scattering properties and lithographic processes.