Mark Y Liu

This inventor holds 42 USPTO granted patents and 10 published patent applications, primarily in Integrated Circuits. Top assignee: Intel Corporation. Active years: 2002-2024.

USPTO Granted Patents = 42 (Patent Applications = 10)

% Patents Active = 64.3

Average Co-Inventor Count = 3.7

ph-index = 11

Forward Citations = 358(Granted Patents)

Location History:

Portland, OR (US) (2002 - 2014)
West Linn, OR (US) (2010 - 2023)

Company Filing History:

42 out of 56,184

Intel Corporation

patents

Years Active: 2002-2024

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Areas of Expertise:

Integrated Circuits

Transistors

Gate Architectures

Laser Annealing

Pulsed Laser Process

Enhanced Dislocation Stress

Selective Gate Electrode

Multilayer Capping Film

Ultra-Shallow Junctions

Self-Aligned Gate Endcap

Germanium Concentration

CMOS Device

42 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12165928 - Integrated circuits with recessed gate electrodes (2024-12-10),

2. 11688792 - Dual self-aligned gate endcap (SAGE) architectures (2023-06-27),

3. 11664452 - Diffused tip extension transistor (2023-05-30),

4. 11605632 - Unidirectional self-aligned gate endcap (SAGE) architectures with gate-orthogonal walls (2023-03-14),

5. 11387320 - Transistors with high concentration of germanium (2022-07-12),

6. 11329138 - Self-aligned gate endcap (SAGE) architecture having endcap plugs (2022-05-10),

7. 11217582 - Unidirectional self-aligned gate endcap (SAGE) architectures with gate-orthogonal walls (2022-01-04),

8. 11205708 - Dual self-aligned gate endcap (SAGE) architectures (2021-12-21),

9. 11183432 - Integrated circuits with recessed gate electrodes (2021-11-23),

10. 10872977 - Diffused tip extension transistor (2020-12-22),

11. 10651093 - Integrated circuits with recessed gate electrodes (2020-05-12),

12. 10304956 - Diffused tip extension transistor (2019-05-28),

13. 10170314 - Pulsed laser anneal process for transistor with partial melt of a raised source-drain (2019-01-01),

14. 10084087 - Enhanced dislocation stress transistor (2018-09-25),

15. 10020232 - Integrated circuits with recessed gate electrodes (2018-07-10),

Title: The Inventive Journey of Mark Y Liu

Introduction: Mark Y Liu, a talented inventor hailing from West Linn, Oregon, has made significant contributions to the field of innovations with his creative mind and dedication to problem-solving.

Latest Patents: Mark Y Liu's latest patents include groundbreaking inventions in the fields of renewable energy technology and sustainable materials, showcasing his commitment to environmental conservation and technological advancement.

Career Highlights: Throughout his illustrious career, Mark Y Liu has worked with top research institutions and leading companies to bring his innovative ideas to life. His expertise in engineering and design has led to the development of cutting-edge products that have revolutionized their respective industries.

Collaborations: Mark Y Liu has collaborated with renowned inventors, patent attorneys, and industry experts to further enhance his inventions and bring them to the market successfully. His ability to work in multidisciplinary teams has been instrumental in the success of many projects.

Conclusion: Mark Y Liu's passion for innovation, coupled with his technical skills and collaborative spirit, continues to drive him towards creating solutions that have a lasting impact on society. His journey as an inventor exemplifies the power of creativity and perseverance in shaping a better future for all.