Santa Clara, CA, United States of America

Manuel Hernandez

This inventor holds 6 USPTO granted patents. Top assignee: Applied Materials, Inc.. Active years: 2003-2013.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Manuel Hernandez. Retrieved from https://idiyas.com/inventor/manuel-hernandez-ddoeid2y

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 16.7

Average Co-Inventor Count = 3.5

ph-index = 3

Forward Citations = 232(Granted Patents)


Location History:

  • Sunnyvale, CA (US) (2003 - 2007)
  • Santa Clara, CA (US) (2011 - 2013)

Company Filing History:


Years Active: 2003-2013

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6 patents (USPTO):Explore Patents

Title: Manuel Hernandez: Innovator in Semiconductor Technology

Introduction

Manuel Hernandez is a prominent inventor based in Santa Clara, CA (US). He has made significant contributions to the field of semiconductor technology, holding a total of 6 patents. His innovative work focuses on improving the properties and conformality of dielectric materials used in semiconductor substrates.

Latest Patents

Hernandez's latest patents include methods for forming a dielectric liner layer on a semiconductor substrate. One of his notable inventions describes a method that involves flowing a phosphorus-containing precursor along with silicon and oxygen-containing precursors over the substrate to deposit a dielectric material. This method allows for the deposition of dielectric material along a field region and within at least one via on the substrate, achieving a depth of at least 1 µm. Additionally, he has developed a method for improving the conformality of oxide layers along the sidewalls of deep vias. This method includes forming a nitride layer over the semiconductor substrate and creating a via that extends through the nitride layer. The oxide layer is then formed using a thermal chemical vapor deposition (CVD) process, ensuring that the thickness of the oxide layer at the bottom of the via is at least 50% of that at the top surface of the nitride layer.

Career Highlights

Manuel Hernandez is currently employed at Applied Materials, Inc., where he continues to advance semiconductor technology. His work has been instrumental in enhancing the performance and reliability of semiconductor devices.

Collaborations

Hernandez collaborates with notable colleagues such as Lei Luo and Shankar Venkataraman, contributing to a dynamic research environment that fosters innovation.

Conclusion

Manuel Hernandez is a key figure in the semiconductor industry, with a focus on improving dielectric materials and processes. His contributions through his patents and collaborations continue to shape the future of semiconductor technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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