Singapore, Singapore

Luona Goh

USPTO Granted Patents = 5 

Average Co-Inventor Count = 4.9

ph-index = 2

Forward Citations = 28(Granted Patents)


Location History:

  • Singapore 460108, SG (2006)
  • Singapore, SG (2004 - 2015)

Company Filing History:


Years Active: 2004-2015

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5 patents (USPTO):

Title: Luona Goh: Innovator in Integrated Circuit Technology

Introduction

Luona Goh is a prominent inventor based in Singapore, known for his significant contributions to the field of integrated circuit technology. With a total of five patents to his name, Goh has made strides in enhancing the reliability and performance of semiconductor devices.

Latest Patents

Among his latest innovations, Goh has developed a stress liner for stress engineering. This invention features a stress liner that incorporates first and second stress types over both first and second type transistors. The design aims to improve reliability and performance without incurring area penalties or layout deficiencies. Another notable patent involves an integrated circuit that includes a stressed dielectric layer with stable stress. This method fabricates an integrated circuit by providing a substrate with an active region and an adjacent opening. The opening is filled with a dielectric material to create an isolation region, while a transistor is formed in the active region. A pre-metal dielectric layer is then formed over the substrate and transistor, with at least one dielectric layer containing a stressed OTEOS oxide that includes a stress-retaining dopant.

Career Highlights

Luona Goh has worked with notable companies in the semiconductor industry, including Chartered Semiconductor Manufacturing Ltd and Globalfoundries Singapore Pte. Ltd. His experience in these organizations has contributed to his expertise in integrated circuit design and manufacturing.

Collaborations

Goh has collaborated with several professionals in his field, including Simon Yew-Meng Chooi and Siew Lok Toh. These collaborations have likely enriched his work and led to further advancements in technology.

Conclusion

Luona Goh's innovative work in integrated circuit technology showcases his commitment to improving semiconductor performance and reliability. His patents reflect a deep understanding of stress engineering and dielectric materials, positioning him as a key figure in the industry.

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