Jiangsu, China

Lu Chen

This inventor holds 7 USPTO granted patents and 5 published patent applications and 1 EPO patent. Top assignees: Jiangsu Leuven Instruments Co. Ltd, Nantong Memtech Technologies Co., Ltd., Suzhou China Star Optoelectronics Technology Co., Ltd.. Active years: 2024-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lu Chen. Retrieved from https://idiyas.com/inventor/lu-chen-8sejcm87

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 7 

% Patents Active = 100.0

 

Average Co-Inventor Count = 7.0

ph-index = 1


Location History:

  • Jiangsu, CN (2024)
  • Xuzhou, CN (2024)

Company Filing History:


Years Active: 2024-2025

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7 patents (USPTO):Explore Patents

Title: Innovations of Inventor Lu Chen

Introduction

Lu Chen is a notable inventor based in Jiangsu, China, recognized for his contributions to the field of electrical engineering. He holds a total of seven patents, showcasing his innovative spirit and technical expertise. His work primarily focuses on the development of advanced materials and methods that enhance the performance and reliability of electronic devices.

Latest Patents

Among his latest patents is the invention of a rubber and metal composite electric contact and its preparation method. This innovative electric contact features a circular layered complex formed by tightly combining a metal sheet layer with multiple through holes and a rubber layer through thermal vulcanization molding. The design ensures that there is no isolation layer between the rubber and metal, preventing any rubber overflow on the metal's outer surface. This combination results in a robust electric contact with adjustable overall strength, excellent dust resistance, and stable electrical conductivity.

Another significant patent is the multilayer magnetic tunnel junction etching method and MRAM device. This method involves processing a wafer through specific steps without interrupting the vacuum environment. By utilizing both a reactive ion plasma etching chamber and an ion beam etching chamber, the method enhances the performance and reliability of the device while significantly reducing metal contamination and damage to the magnetic tunnel junction film structure. This innovative approach addresses the limitations of existing single etching methods, thereby improving production efficiency and etching precision.

Career Highlights

Lu Chen has worked with several prominent companies, including Jiangsu Leuven Instruments Co. Ltd and Nantong Memtech Technologies Co., Ltd. His experience in these organizations has allowed him to apply his innovative ideas in practical settings, contributing to advancements in technology.

Collaborations

Lu has collaborated with various professionals in his field, including Dongdong Hu and Dongchen Che, who have contributed to his projects and innovations.

Conclusion

Lu Chen's inventive work in the realm of electrical engineering exemplifies the impact of innovation on technology. His patents not only enhance the functionality of electronic devices but also pave the way for future advancements in the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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