The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 02, 2024
Filed:
Sep. 18, 2019
Jiangsu Leuven Instruments Co. Ltd, Xuzhou, CN;
Xiaobo Liu, Xuzhou, CN;
Xuedong Li, Xuzhou, CN;
Yong Qiu, Xuzhou, CN;
Na Li, Xuzhou, CN;
Yonggang Hou, Xuzhou, CN;
Dongdong Hu, Xuzhou, CN;
Lu Chen, Xuzhou, CN;
Kaidong Xu, Xuzhou, CN;
JIANGSU LEUVEN INSTRUMENTS CO. LTD, Xuzhou, CN;
Abstract
An etching uniformity regulating device and method. The device comprises an inductor and a capacitor connected in parallel. One end of the etching uniformity regulating device is connected to a built-in ring located at the edge of an electrostatic chuck of an etching machine, and the other end is grounded. The purpose of controlling the edge electric field is achieved by regulating a capacitance of the capacitor, so as to regulate the etching rate of the edge, thereby achieving etching uniformity.