Introduction: Linlin Wang, based in Fremont, CA, is an accomplished inventor with an impressive portfolio of nine patents. Her expertise in semiconductor technology has contributed significantly to advancements in device performance and thin film treatments, making her a notable figure in her field.

Latest Patents: Among Linlin Wang's latest innovations are two notable patents. The first patent focuses on treatments designed to enhance device performance. This method involves a sophisticated process of forming a semiconductor structure, which includes annealing a substrate surface in a hydrogen atmosphere, pre-cleaning the substrate, and subsequently depositing a high-κ dielectric layer. The process progresses with a re-oxidation step to thermally oxidize the substrate surface, followed by a plasma nitridation process to introduce nitrogen atoms into the dielectric layer, ultimately culminating in a post-nitridation anneal that passivates chemical bonds in the layer.

The second patent details a method for modifying a layer within a semiconductor device. This patent outlines a procedure where a low-quality film is deposited on a semiconductor substrate and then treated with two different process gases—helium and oxygen—while the substrate is maintained at varying temperatures. This innovative approach leads to improved electrical properties of the film, enhancing the overall functionality of semiconductor devices.

Career Highlights: Linlin Wang is currently affiliated with Applied Materials, Inc., a leading company in the semiconductor equipment sector. Her contributions to semiconductor technologies through her patents indicate a strong commitment to research and development in this rapidly evolving industry.

Collaborations: Throughout her career, Linlin has collaborated with several talented individuals, including Abhijit Basu Mallick and Nitin K Ingle. These collaborations have played a crucial role in driving innovation and advancing projects within her company.

Conclusion: Linlin Wang's contributions to semiconductor technology highlight her role as a pioneering inventor. With her nine patents showcasing groundbreaking methods to improve device performance and the quality of semiconductor films, she remains a key player in the field. Her work continues to drive advancements in technology, making her an invaluable asset to Applied Materials, Inc. and the greater scientific community.

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