The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2012
Filed:
Aug. 31, 2009
Kedar Sapre, Mountain View, CA (US);
Jing Tang, Santa Clara, CA (US);
Linlin Wang, San Jose, CA (US);
Abhijit Basu Mallick, Palo Alto, CA (US);
Nitin Ingle, Santa Clara, CA (US);
Kedar Sapre, Mountain View, CA (US);
Jing Tang, Santa Clara, CA (US);
Linlin Wang, San Jose, CA (US);
Abhijit Basu Mallick, Palo Alto, CA (US);
Nitin Ingle, Santa Clara, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of etching silicon-and-carbon-containing material is described and includes a SiConi™ etch in combination with a flow of reactive oxygen. The reactive oxygen may be introduced before the SiConi™ etch reducing the carbon content in the near surface region and allowing the SiConi™ etch to proceed more rapidly. Alternatively, reactive oxygen may be introduced during the SiConi™ etch further improving the effective etch rate.