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For the Inventor, By the Inventor

Vancouver, WA, United States of America

Lawrence J Charneski

This inventor holds 28 USPTO granted patents, primarily in Copper Metallization. Top assignees: Sharp Laboratories of America, Inc, Sharp Kabushiki Kaisha Corporation, Sharp Microelectronics Technology, Inc.. Active years: 1998-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Lawrence J Charneski. Retrieved from https://idiyas.com/inventor/lawrence-j-charneski

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 28

% Patents Active = 78.6

Average Co-Inventor Count = 3.5

ph-index = 9

Forward Citations = 239(Granted Patents)


Company Filing History:

goldMedal17 out of 2,034 
 
Sharp Laboratories of America, Inc
 patents
silverMedal9 out of 25,954 
 
Sharp Kabushiki Kaisha Corporation
 patents
bronzeMedal5 out of 69 
 
Sharp Microelectronics Technology, Inc.
 patents
4. 2 out of 622 
 
Advanced Technology Materials, Inc.
 patents
5. 4 out of 834,513 
Other
 patents
where one patent can have more than one assignee

Years Active: 1998-2010

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Areas of Expertise:
Nanorod Sensor
Bipolar Switching
PCMO Capacitor
Copper Precursor
Adhesion Promotion
CVD Copper
Integrated Circuit
Chemical Vapor Deposition
Copper Thin Film
Oxidized Diffusion Barrier
Conductivity Enhancement
28 patents (USPTO):Explore Patents
1. 7759150 - Nanorod sensor with single-plane electrodes (2010-07-20),
2. 7696550 - Bipolar switching PCMO capacitor (2010-04-13),
3. 7235407 - System and method for forming a bipolar switching PCMO film (2007-06-26),
4. 7098101 - [object Object] (2006-08-29),
5. 6972239 - [object Object] (2005-12-06),
6. 6764537 - Copper metal precursor (2004-07-20),
7. 6669870 - Substituted phenylethylene precursor synthesis method (2003-12-30),
8. 6645860 - Adhesion promotion method for CVD copper metallization in IC applications (2003-11-11),
9. 6596344 - Method of depositing a high-adhesive copper thin film on a metal nitride substrate (2003-07-22),
10. 6555916 - Integrated circuit prepared by selectively cleaning copper substrates, in-situ, to remove copper oxides (2003-04-29),
11. 6355562 - Adhesion promotion method for CVD copper metallization in IC applications (2002-03-12),
12. 6284652 - Adhesion promotion method for electro-chemical copper metallization in IC applications (2001-09-04),
13. 6284052 - In-situ method of cleaning a metal-organic chemical vapor deposition chamber (2001-09-04),
14. 6281589 - System of selectively cleaning copper substrate surfaces, in-situ, to remove copper oxides (2001-08-28),
15. 6281377 - Substituted cycloalkene new copper precursors for chemical vapor deposition of copper metal thin films (2001-08-28),

Title: The Innovative Mind of Lawrence J Charneski

Introduction:

Lawrence J Charneski, a brilliant inventor hailing from Vancouver, WA, has made significant contributions to the field of nanotechnology with an impressive portfolio of 28 patents under his belt.

Latest Patents:

Among his latest patents is a groundbreaking invention - the Nanorod Sensor with Single-Plane Electrodes. This invention revolves around a nanorod sensor featuring horizontally-aligned electrodes, offering a novel fabrication method that enhances sensor performance. Additionally, Charneski introduced the Bipolar Switching PCMO Capacitor, pioneering a multi-layer thin film capacitor with unique bipolar switching properties.

Career Highlights:

Charneski's innovation prowess was honed during his time at Sharp Laboratories of America, Inc, and Sharp Kabushiki Kaisha Corporation. His tenure at these esteemed companies allowed him to thrive in a dynamic research environment, fostering the development of cutting-edge technologies.

Collaborations:

Throughout his career, Charneski collaborated closely with notable peers such as Tue H Nguyen and Sheng Teng Hsu. Together, they pushed the boundaries of scientific discovery, creating solutions that have the potential to revolutionize the industry.

Conclusion:

Lawrence J Charneski stands as a prominent figure in the realm of inventors, showcasing a relentless dedication to pushing the boundaries of innovation. His groundbreaking patents and collaborative spirit exemplify his commitment to advancing technology and shaping the future of nanotechnology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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