The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 20, 2010
Filed:
May. 22, 2007
Fengyan Zhang, Camas, WA (US);
Bruce D. Ulrich, Beaverton, OR (US);
Wei Pan, Vancouver, WA (US);
Lawrence J. Charneski, Vancouver, WA (US);
Sheng Teng Hsu, Camas, WA (US);
Fengyan Zhang, Camas, WA (US);
Bruce D. Ulrich, Beaverton, OR (US);
Wei Pan, Vancouver, WA (US);
Lawrence J. Charneski, Vancouver, WA (US);
Sheng Teng Hsu, Camas, WA (US);
Sharp Laboratories of America, Inc., Camas, WA (US);
Abstract
A nanorod sensor with a single plane of horizontally-aligned electrodes and an associated fabrication method are provided. The method provides a substrate and forms an intermediate electrode overlying a center region of the substrate. The intermediate electrode is a patterned bottom noble metal/Pt/Ti multilayered stack. TiOnanorods are formed over the substrate and intermediate electrode, and a TiOfilm may be formed overlying the TiOnanorods. The TiOnanorods and TiOfilm are formed in-situ, in the same process, by varying the substrate temperature. In other aspects, the TiOfilm is formed between the nanorods and the intermediate electrode. In yet another aspect, the TiOfilm is formed both above and below the nanorods. A single plane of top electrodes is formed overlying the TiOfilm from a top noble metal/Pt/Ti multilayered stack overlying the TiOfilm, which has been selectively etched to form separate top electrodes.