Suwon-si, South Korea

Kyo-Suk Chae

USPTO Granted Patents = 11 

Average Co-Inventor Count = 4.3

ph-index = 2

Forward Citations = 23(Granted Patents)


Company Filing History:


Years Active: 2013-2025

Loading Chart...
11 patents (USPTO):Explore Patents

Title: Kyo-Suk Chae: Innovator in Semiconductor Technology

Introduction

Kyo-Suk Chae is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 11 patents. His work focuses on innovative semiconductor devices that enhance performance and efficiency.

Latest Patents

One of Kyo-Suk Chae's latest patents is for a semiconductor device that features conductive portions in a groove, which contacts a gate insulating layer. This invention includes a substrate with a groove extending in a first direction, a gate insulating layer within the groove, and a first conductive pattern on the gate insulating layer. The design allows for improved functionality and integration of semiconductor components. Another notable patent involves a semiconductor device that incorporates trenches and contact recesses with a curved surface profile. This device includes conductive patterns in the trenches and buried contacts that enhance the overall structure and performance of the semiconductor.

Career Highlights

Kyo-Suk Chae is currently employed at Samsung Electronics Co., Ltd., where he continues to push the boundaries of semiconductor technology. His innovative designs and patents have contributed to the advancement of the industry, making him a key figure in his field.

Collaborations

Some of Kyo-Suk Chae's coworkers include Satoru Yamada and Won-Kyung Park, who collaborate with him on various projects within the semiconductor domain.

Conclusion

Kyo-Suk Chae's contributions to semiconductor technology through his patents and work at Samsung Electronics Co., Ltd. highlight his role as an influential inventor. His innovative designs continue to shape the future of the semiconductor industry.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…