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For the Inventor, By the Inventor

Hiroshima, Japan

Kuo-Chen Wang

USPTO Granted Patents = 20

Average Co-Inventor Count = 2.5

ph-index = 4

Forward Citations = 53(Granted Patents)


Location History:

  • Higashihiroshima, JP (2019)
  • New Taipei, TW (2018 - 2020)
  • Tokyo, JP (2020 - 2022)
  • Hiroshima, JP (2018 - 2024)

Company Filing History:

goldMedal20 out of 37,905 
 
Micron Technology Incorporated
 patents

Years Active: 2018-2024

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20 patents (USPTO):
1. 12069848 - Sense line and cell contact for semiconductor devices (2024-08-20),
2. 11239240 - Methods of forming a semiconductor device (2022-02-01),
3. 11069561 - Methods of forming electronic devices, and related electronic devices and electronic systems (2021-07-20),
4. 11004494 - Memory arrays, and methods of forming memory arrays (2021-05-11),
5. 10978554 - Elevationally-elongated conductive structure of integrated circuitry, method of forming an array of capacitors, method of forming DRAM circuitry, and method of forming an elevationally-elongated conductive structure of integrated circuitry (2021-04-13),
6. 10886278 - Method of forming an array of capacitors, a method of forming DRAM circuitry, and a method of forming an elevationally-elongated conductive structure of integrated circuitry (2021-01-05),
7. 10847518 - Semiconductor devices, memory dies and related methods (2020-11-24),
8. 10707215 - Methods of forming semiconductor devices, and related semiconductor devices, memory devices, and electronic systems (2020-07-07),
9. 10566332 - Semiconductor devices (2020-02-18),
10. 10566136 - Capacitors, integrated assemblies including capacitors, and methods of forming integrated assemblies (2020-02-18),
11. 10475796 - Method of forming an array of capacitors, a method of forming DRAM circuitry, and a method of forming an elevationally-elongated conductive structure of integrated circuitry (2019-11-12),
12. 10461149 - Elevationally-elongated conductive structure of integrated circuitry, method of forming an array of capacitors, method of forming DRAM circuitry, and method of forming an elevationally-elongated conductive structure of integrated circuitry (2019-10-29),
13. 10290422 - Capacitors and integrated assemblies which include capacitors (2019-05-14),
14. 10242726 - Memory arrays, and methods of forming memory arrays (2019-03-26),
15. 10163909 - Methods for fabricating a semiconductor memory device (2018-12-25),

Title: Innovations by Kuo-Chen Wang in Semiconductor Technology

Introduction

Kuo-Chen Wang, based in Hiroshima, Japan, is a prominent inventor in the field of semiconductor technology, holding an impressive portfolio of 20 patents. His work primarily focuses on advanced methods and apparatuses aimed at enhancing semiconductor devices, contributing significantly to the innovation landscape within the electronics industry.

Latest Patents

Among Kuo-Chen Wang's latest patents is a breakthrough related to "Sense line and cell contact for semiconductor devices." This invention describes methods, apparatuses, and systems that involve a sense line material coupled to different source/drain regions via a cell contact made from combined polysilicon materials, demonstrating a novel approach to semiconductor structure design.

Another significant patent under his name describes methods for forming a semiconductor device that includes semiconductive pillars, digit lines, nitride caps, and air gaps, which collectively improve device efficiency and performance. These innovations laid the groundwork for developing advanced memory devices and electronic systems.

Career Highlights

Kuo-Chen Wang has made a remarkable impact at Micron Technology Incorporated, where he continues to push the boundaries of semiconductor design. His work is crucial in supporting the company’s mission to develop leading-edge memory and storage solutions, ensuring they meet the demands of modern technological applications.

Collaborations

Throughout his career, Kuo-Chen Wang has collaborated with several notable colleagues, including Sanh D. Tang and Martin Ceredig Roberts. These partnerships have fostered a thriving environment for innovation and have played a significant role in the successful development of multiple patented technologies.

Conclusion

Kuo-Chen Wang’s contributions to semiconductor technology serve as a testament to his expertise and innovative spirit. With a string of impactful patents and a collaborative approach, he continues to lead in the field, shaping the future of electronic devices and systems. His efforts at Micron Technology Incorporated exemplify the dynamic interplay between inventors and companies in driving technological advancements forward.

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