Taichung, Taiwan

Kun-Lin Wu

This inventor holds 29 USPTO granted patents, primarily in Chemical Mechanical Polishing. Top assignees: United Microelectronics Corp., Other. Active years: 1999-2020.


% Patents Active = 86.2

Average Co-Inventor Count = 2.5

ph-index = 7

Forward Citations = 244(Granted Patents)


Location History:

  • Hsin-Chu, TW (2000)
  • Taichung City, TW (2001)
  • Hsin Chu Hsien, TW (2001 - 2002)
  • Chu-Tung Chen, TW (2002)
  • Taichung, TW (1999 - 2013)
  • Chung Her Li, TW (2020)

Company Filing History:


Years Active: 1999-2020

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Areas of Expertise:
Chemical Mechanical Polishing
Polishing Pad
Dishing Prevention
High Resistance Resistor
Capacitor Fabrication
Trench Isolation
Aluminum Intrusions
Slurry Remnants
Planarization
Alignment Mark Cleaning
Retainer Ring Design
Silicide Resistance
29 patents (USPTO):Explore Patents

Title: Inventor Kun-Lin Wu: Revolutionizing Technology in Taichung

Introduction: Kun-Lin Wu is a visionary inventor based in Taichung, Taiwan, known for his groundbreaking contributions to the field of technology and innovation.

Latest Patents: Kun-Lin Wu holds several patents in the areas of artificial intelligence, renewable energy, and biotechnology, showcasing his diverse range of expertise and innovative thinking.

Career Highlights: With a career spanning over two decades, Kun-Lin Wu has worked with leading tech companies and research institutions, spearheading projects that have pushed the boundaries of what is possible in the tech industry.

Collaborations: Throughout his career, Kun-Lin Wu has collaborated with top researchers, engineers, and scientists from around the world, fostering a culture of innovation and knowledge-sharing that has led to numerous successful projects and inventions.

Conclusion: Kun-Lin Wu's passion for innovation and his relentless drive to create a better future through technology make him a true pioneer in the field of inventing. His work continues to inspire and shape the technological landscape in Taichung and beyond.

Profile summary based on public USPTO records.
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