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For the Inventor, By the Inventor

Tosu, Japan

Koukichi Hiroshiro

USPTO Granted Patents = 14


Average Co-Inventor Count = 3.6

ph-index = 3

Forward Citations = 26(Granted Patents)


Location History:

  • Tosu, JP (2011 - 2016)
  • Kumamoto, JP (2021)
  • Koshi, JP (2011 - 2023)

Company Filing History:

goldMedal14 out of 10,295 
 
Tokyo Electron Limited
 patents

Years Active: 2011-2025

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14 patents (USPTO):
1. 12203021 - Substrate processing device and etching liquid (2025-01-21),
2. 11723259 - Substrate processing apparatus and method of processing substrate (2023-08-08),
3. 11306249 - Substrate processing method, substrate processing device and etching liquid (2022-04-19),
4. 11049723 - Substrate processing method and substrate processing apparatus (2021-06-29),
5. 9415356 - Chemical-liquid mixing method and chemical-liquid mixing apparatus (2016-08-16),
6. 9339775 - Chemical-liquid mixing method and chemical-liquid mixing apparatus (2016-05-17),
7. 9099502 - Chemical-liquid mixing method and chemical-liquid mixing apparatus (2015-08-04),
8. 8701308 - Fluid heater, manufacturing method thereof, substrate processing apparatus including fluid heater, and substrate processing method (2014-04-22),
9. 8522712 - Template treatment method, program, computer storage medium, template treatment apparatus and imprint system (2013-09-03),
10. 8468943 - Imprint method, computer storage medium and imprint apparatus (2013-06-25),
11. 8303724 - Substrate processing method and non-transitory storage medium for carrying out such method (2012-11-06),
12. 8152928 - Substrate cleaning method, substrate cleaning system and program storage medium (2012-04-10),
13. 8015984 - Substrate processing apparatus including a drying mechanism using a fluid mixture of purified water and a volatile organic solvent (2011-09-13),
14. 7998306 - Substrate processing apparatus (2011-08-16),

Title: Koukichi Hiroshiro: Innovator in Substrate Processing Technology

Introduction

Koukichi Hiroshiro is a prominent inventor based in Tosu, Japan. He has made significant contributions to the field of substrate processing, holding a total of 14 patents. His work focuses on developing advanced methods and devices that enhance the efficiency and effectiveness of substrate processing.

Latest Patents

Hiroshiro's latest patents include a substrate processing device and an etching liquid. The substrate processing method he developed involves holding a substrate and supplying an etching liquid that contains an etching agent designed to etch a metal-based first material and a silicon-based second material. This innovative etching liquid also includes a protection agent that reacts with the second material to form a protective layer, safeguarding it from etching. Additionally, he has patented a substrate processing apparatus that outlines a method for processing a substrate by removing processing liquid and making the substrate water-repellent, followed by drying it with an organic solvent.

Career Highlights

Koukichi Hiroshiro is associated with Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work has been instrumental in advancing substrate processing technologies, which are crucial for the production of electronic components.

Collaborations

Hiroshiro has collaborated with notable coworkers such as Takayuki Toshima and Yuji Kamikawa. Their combined expertise has contributed to the development of innovative solutions in substrate processing.

Conclusion

Koukichi Hiroshiro's contributions to substrate processing technology have established him as a key figure in the field. His innovative patents and collaborations continue to influence advancements in semiconductor manufacturing.

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