Location History:
- Tokyo, JP (1998 - 2004)
- Tokyo-to, JP (2000 - 2004)
- Nirasakishi Yamanashi, JP (2005 - 2007)
- Peabody, MA (US) (2008)
Company Filing History:
11 out of 10,341 
1 out of 832,891 Years Active: 1998-2008
Title: Kouichiro Inazawa: Innovator in Plasma Processing Technologies
Introduction
Kouichiro Inazawa is a prominent inventor based in Tokyo, Japan. He has made significant contributions to the field of plasma processing technologies, holding a total of 12 patents. His innovative approaches have advanced the methods used in semiconductor manufacturing and related industries.
Latest Patents
Inazawa's latest patents include a method and apparatus for bilayer photoresist dry development. This method involves etching an organic anti-reflective coating (ARC) layer on a substrate using a plasma processing system. The process gas used comprises nitrogen (N), hydrogen (H), and oxygen (O), which forms a plasma that exposes the substrate. Additionally, he has developed a method for removing photoresist and etch residues through a two-step plasma ashing process. This method effectively reduces the memory effect commonly observed in conventional one-step ashing processes.
Career Highlights
Throughout his career, Kouichiro Inazawa has worked with notable companies, including Tokyo Electron Limited. His work has been instrumental in enhancing the efficiency and effectiveness of plasma processing techniques.
Collaborations
Inazawa has collaborated with several professionals in his field, including Masahiro Yamada and Youbun Ito. These collaborations have contributed to the development of innovative solutions in plasma processing.
Conclusion
Kouichiro Inazawa's contributions to plasma processing technologies have established him as a key figure in the industry. His innovative patents and collaborative efforts continue to influence advancements in semiconductor manufacturing.