Kirk J Strozewski

Title: Kirk J Strozewski: Innovator in Semiconductor Design

Introduction

Kirk J Strozewski is a prominent inventor based in Round Rock, TX (US), known for his significant contributions to semiconductor technology. With a total of six patents to his name, he has made notable advancements in the field of design manufacturability and interconnect technology.

Latest Patents

One of his latest patents is titled "Layout modification using multilayer-based constraints." This innovative method enhances the manufacturability of designs by performing space or enclosure checks on multiple interacting layers of a layout design. The resulting data is utilized to adjust predetermined feature edges in an altered design database, thereby reducing the risk of features being patterned smaller than intended. In certain embodiments, the upsized features are larger in the wafer circuit pattern than those drawn in the design database. This method is also stored on a computer-readable storage medium.

Another significant patent is "Semiconductor device having a multiple thickness interconnect." This invention addresses RC delays and noise coupling by varying the thickness of conductive lines. By doing so, it avoids unnecessary variations in conductor width while maintaining a specified minimum pitch between conductors. The method allows for the automated analysis of interconnect thickness variations to meet desired design criteria, which can be provided as a CAD tool.

Career Highlights

Kirk J Strozewski is currently employed at Freescale Semiconductor, Inc., where he continues to innovate and contribute to the semiconductor industry. His work focuses on improving design manufacturability and enhancing the performance of semiconductor devices.

Collaborations

Throughout his career, Strozewski has collaborated with notable colleagues, including Yeong-Jyh Tom Lii and Kathleen C Yu. These collaborations have further enriched his work and contributed to the advancements in semiconductor technology.

Conclusion

Kirk J Strozewski is a distinguished inventor whose work in semiconductor design has led to significant advancements in manufacturability and interconnect technology. His innovative patents reflect his commitment to improving the efficiency and performance of semiconductor devices.