Kim Long

Title: Kim Long - Innovator in Chemical Mechanical Polishing

Introduction

Kim Long is a notable inventor based in Naperville, IL (US), recognized for her contributions to the field of chemical mechanical polishing. With a total of six patents to her name, she has made significant advancements in polishing compositions that enhance the efficiency and effectiveness of semiconductor manufacturing processes.

Latest Patents

Among her latest patents, one includes a CMP composition featuring a novel abrasive. This chemical mechanical polishing composition consists of a liquid carrier and colloidal silica particles that are positively charged, with a number average aspect ratio exceeding 1.25. The composition may also include an iron-containing accelerator and a tungsten etch inhibitor, particularly when applied as a tungsten CMP composition. Another patent focuses on tungsten buff polishing compositions that improve topography. This invention comprises surface-modified colloidal silica particles with a negative charge, an iron compound, a stabilizing agent, a corrosion inhibitor, and an aqueous carrier. The method provided is suitable for polishing substrates effectively.

Career Highlights

Kim Long has worked with prominent companies such as Ecolab USA Inc. and CMC Materials, Inc. Her experience in these organizations has allowed her to develop innovative solutions that address the challenges faced in the semiconductor industry.

Collaborations

Throughout her career, Kim has collaborated with talented individuals, including Michael A. Kamrath and Sean McCue. These partnerships have contributed to her success and the advancement of her inventions.

Conclusion

Kim Long's work in chemical mechanical polishing has significantly impacted the semiconductor industry. Her innovative patents and collaborations highlight her dedication to advancing technology in this field.