The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 12, 2019

Filed:

Apr. 04, 2006
Applicants:

Francois Batllo, Burr Ridge, IL (US);

Brian T. Holland, Oak Park, IL (US);

John M. Krasniewski, Charlotte, NC (US);

Kim M. Long, Naperville, IL (US);

Michael A. Romba, Joliet, IL (US);

Sascha Welz, Chicago, IL (US);

David P. Workman, Naperville, IL (US);

Inventors:

Francois Batllo, Burr Ridge, IL (US);

Brian T. Holland, Oak Park, IL (US);

John M. Krasniewski, Charlotte, NC (US);

Kim M. Long, Naperville, IL (US);

Michael A. Romba, Joliet, IL (US);

Sascha Welz, Chicago, IL (US);

David P. Workman, Naperville, IL (US);

Assignee:

Ecolab USA Inc., St. Paul, MN (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01J 21/12 (2006.01); B01J 35/10 (2006.01); B01J 37/03 (2006.01); C09C 1/30 (2006.01); C01B 33/18 (2006.01); C01B 33/26 (2006.01); D21H 17/67 (2006.01); C01B 33/143 (2006.01); C01B 33/146 (2006.01); B82Y 30/00 (2011.01); B41M 5/52 (2006.01); A23L 2/80 (2006.01); D21H 17/68 (2006.01); D21H 19/38 (2006.01); D21H 19/40 (2006.01); D21H 21/52 (2006.01);
U.S. Cl.
CPC ...
C01B 33/26 (2013.01); A23L 2/80 (2013.01); B01J 21/12 (2013.01); B01J 35/1019 (2013.01); B01J 35/1023 (2013.01); B01J 35/1042 (2013.01); B01J 35/1061 (2013.01); B01J 37/03 (2013.01); B41M 5/5218 (2013.01); B82Y 30/00 (2013.01); C01B 33/143 (2013.01); C01B 33/146 (2013.01); C01B 33/18 (2013.01); C09C 1/3054 (2013.01); D21H 17/675 (2013.01); D21H 17/68 (2013.01); D21H 19/385 (2013.01); D21H 19/40 (2013.01); C01P 2004/64 (2013.01); C01P 2006/12 (2013.01); C01P 2006/14 (2013.01); C01P 2006/16 (2013.01); D21H 21/52 (2013.01);
Abstract

A method of preparing a particulate material comprising the steps of adding silicic acid solution, optionally doped with aluminum, optionally added to a slurry of pre-existing nanoparticles at a neutral to slightly acidic pH of no more than seven, and at a temperature of about 20° to 30° C. This yields a polysilicate particulate dispersion. Then, the pH of the dispersion is raised to greater than seven, to stabilize/reinforce particles of the particulate dispersion. Optionally, the particles may be dried, and have increased porosity and surface area.


Find Patent Forward Citations

Loading…