Suwon, South Korea

Ki-il Kim

This inventor holds 14 USPTO granted patents and 16 published patent applications and 2 EPO patents, primarily in Semiconductor Devices. Top assignee: Samsung Electronics Co., Ltd.. Active years: 2015-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ki-il Kim. Retrieved from https://idiyas.com/inventor/ki-il-kim-zqabd4ns

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 14 

% Patents Active = 78.6

 

Average Co-Inventor Count = 3.5

ph-index = 3

Forward Citations = 48(Granted Patents)


Company Filing History:


Years Active: 2015-2026

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Areas of Expertise:
Semiconductor Device
Fin Field Effect Transistor
Integrated Circuit
Substrate Processing
Asymmetric Fin-Type Patterns
Fabrication Method
Active Pattern Structure
Device Isolation Layers
14 patents (USPTO):Explore Patents

Title: Ki-il Kim: Innovator in Semiconductor Technology

Introduction

Ki-il Kim is a prominent inventor based in Suwon-si, South Korea. He has made significant contributions to the field of semiconductor technology, holding a total of 14 patents. His work focuses on improving electrical characteristics and integration density in semiconductor devices.

Latest Patents

One of Ki-il Kim's latest patents is a semiconductor device and method for fabricating the same. This invention provides a semiconductor device capable of enhancing electrical characteristics and integration density. The device features an active pattern protruding from a substrate, which includes long sidewalls extending in a first direction and opposite to each other in a second direction. Additionally, it comprises a lower epitaxial pattern on the substrate that covers part of the active pattern, a gate electrode on the lower epitaxial pattern extending along the long sidewalls, and an upper epitaxial pattern connected to the upper surface of the active pattern. Notably, at least one of the short sidewalls of the active pattern has a curved surface.

Another significant patent involves a semiconductor device having a fin-type pattern with varying widths along a center vertical line. This device includes a field insulating film on a substrate and a fin-type pattern of a particular material. The fin-type pattern features a first sidewall and an opposing second sidewall, with multiple portions that protrude from the upper surface of the field insulating film. The design includes an undulated profile that spans the various portions of the fin-type pattern.

Career Highlights

Ki-il Kim is currently employed at Samsung Electronics Co., Ltd., where he continues to innovate in semiconductor technology. His work has been instrumental in advancing the capabilities of semiconductor devices, making them more efficient and effective.

Collaborations

Throughout his career, Ki-il Kim has collaborated with notable colleagues, including Gi-Gwan Park and Jung-Gun You. These partnerships have contributed to the development of cutting-edge technologies in the semiconductor field.

Conclusion

Ki-il Kim's contributions to semiconductor technology through his innovative patents and collaborations highlight his role as a leading inventor in the industry. His work continues to influence the advancement of electronic devices, showcasing the importance of innovation in technology.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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