Newark, CA, United States of America

Kenneth Lucchesi

USPTO Granted Patents = 12 

Average Co-Inventor Count = 5.6

ph-index = 5

Forward Citations = 242(Granted Patents)


Company Filing History:


Years Active: 2017-2024

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12 patents (USPTO):

Title: Innovations of Kenneth Lucchesi

Introduction

Kenneth Lucchesi is a prominent inventor based in Newark, California. He has made significant contributions to the field of plasma technology, holding a total of 12 patents. His work primarily focuses on systems and methods that enhance the efficiency of plasma chambers.

Latest Patents

One of his latest patents is titled "Systems and methods for cleaning an edge ring pocket." This invention describes a method that involves providing one or more process gases to a plasma chamber and supplying low frequency radio frequency power to an edge ring adjacent to a chuck of the plasma chamber. The method aims to maintain plasma within the chamber while increasing the energy of plasma ions near the edge ring pocket to effectively remove residue. Another notable patent is "Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber." This invention outlines a method for synchronizing RF signals to achieve specific operational factors, enhancing the performance of the plasma chamber.

Career Highlights

Kenneth Lucchesi is currently employed at Lam Research Corporation, a leading company in the semiconductor equipment industry. His innovative work has contributed to advancements in plasma processing technology, making significant impacts in the field.

Collaborations

Some of his notable coworkers include Alexei Marakhtanov and John Patrick Holland. Their collaborative efforts have further propelled advancements in the technologies they work on.

Conclusion

Kenneth Lucchesi's contributions to plasma technology through his patents and work at Lam Research Corporation highlight his role as an influential inventor in the industry. His innovative methods continue to shape the future of plasma processing.

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