The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 07, 2019
Filed:
Jun. 28, 2017
Lam Research Corporation, Fremont, CA (US);
Alexei Marakhtanov, Albany, CA (US);
Felix Kozakevich, Sunnyvale, CA (US);
Michael C. Kellogg, San Francisco, CA (US);
John Patrick Holland, San Jose, CA (US);
Zhigang Chen, Campbell, CA (US);
Kenneth Lucchesi, Newark, CA (US);
Lin Zhao, Fremont, CA (US);
Lam Research Corporation, Fremont, CA (US);
Abstract
Systems and methods for achieving a pre-determined factor associated with the edge region within the plasma chamber is described. One of the methods includes providing an RF signal to a main electrode within the plasma chamber. The RF signal is generated based on a frequency of operation of a first RF generator. The method further includes providing another RF signal to an edge electrode within the plasma chamber. The other RF signal is generated based on the frequency of operation of the first RF generator. The method includes receiving a first measurement of a variable, receiving a second measurement of the variable, and modifying a phase of the other RF signal based on the first measurement and the second measurement. The method includes changing a magnitude of a variable associated with a second RF generator to achieve the pre-determined factor.