Growing community of inventors

Newark, CA, United States of America

Kenneth Lucchesi

Average Co-Inventor Count = 5.57

ph-index = 5

The patent ph-index is calculated by counting the number of publications for which an author has been cited by other authors at least that same number of times.

Forward Citations = 242

Kenneth LucchesiJohn Patrick Holland (12 patents)Kenneth LucchesiAlexei Marakhtanov (12 patents)Kenneth LucchesiFelix Leib Kozakevich (12 patents)Kenneth LucchesiZhigang Chen (8 patents)Kenneth LucchesiMichael C Kellogg (6 patents)Kenneth LucchesiLin Zhao (4 patents)Kenneth LucchesiEric A Hudson (1 patent)Kenneth LucchesiBing Ji (1 patent)Kenneth LucchesiScott Briggs (1 patent)Kenneth LucchesiKenneth Lucchesi (12 patents)John Patrick HollandJohn Patrick Holland (132 patents)Alexei MarakhtanovAlexei Marakhtanov (100 patents)Felix Leib KozakevichFelix Leib Kozakevich (57 patents)Zhigang ChenZhigang Chen (48 patents)Michael C KelloggMichael C Kellogg (40 patents)Lin ZhaoLin Zhao (5 patents)Eric A HudsonEric A Hudson (117 patents)Bing JiBing Ji (17 patents)Scott BriggsScott Briggs (4 patents)
..
Inventor’s number of patents
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Strength of working relationships

Company Filing History:

1. Lam Research Corporation (12 from 3,768 patents)


12 patents:

1. 11935730 - Systems and methods for cleaning an edge ring pocket

2. 11195706 - Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators

3. 10916409 - Active control of radial etch uniformity

4. 10825656 - Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring

5. 10615003 - Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring

6. 10304662 - Multi regime plasma wafer processing to increase directionality of ions

7. 10283330 - Systems and methods for achieving a pre-determined factor associated with an edge region within a plasma chamber by synchronizing main and edge RF generators

8. 10115568 - Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring

9. 10115564 - Uniformity control circuit for use within an impedance matching circuit

10. 10002746 - Multi regime plasma wafer processing to increase directionality of ions

11. 9852889 - Systems and methods for controlling directionality of ions in an edge region by using an electrode within a coupling ring

12. 9761414 - Uniformity control circuit for use within an impedance matching circuit

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12/4/2025
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