Location History:
- Hsinchu County, TW (2010)
- Jhubei, TW (2012 - 2014)
Company Filing History:
Years Active: 2010-2014
Title: Ken Wu - Innovator in Photomask Technology
Introduction
Ken Wu is a prominent inventor based in Jhubei, Taiwan. He has made significant contributions to the field of photomask technology, holding a total of 3 patents. His work focuses on enhancing the performance and efficiency of photomasks used in semiconductor manufacturing.
Latest Patents
Ken Wu's latest patents include innovative designs aimed at reducing light scattering properties in photomasks. One of his notable patents describes a photomask and photomask substrate that features a substantially light transparent substrate with a circuitry pattern. This pattern includes a phase shifting layer and a light shielding layer, which work together to improve the mask's functionality. Another patent outlines a method for forming a robust mask that involves a photolithographic patterning process, ensuring high precision in semiconductor applications.
Career Highlights
Ken Wu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in photomask technology has positioned him as a key player in the development of advanced manufacturing processes.
Collaborations
Throughout his career, Ken has collaborated with talented individuals such as Luke Hsu and Hung-Chang Hsieh. These partnerships have fostered innovation and contributed to the success of various projects in the semiconductor field.
Conclusion
Ken Wu's contributions to photomask technology exemplify his dedication to innovation in the semiconductor industry. His patents and collaborative efforts continue to influence advancements in manufacturing processes.