The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 01, 2010
Filed:
Mar. 21, 2007
Applicants:
Hung-ting Pan, Pingtung County, TW;
Ken Wu, Hsinchu County, TW;
Luke Hsu, Hsinchu, TW;
Yao-ching Ku, Hsinchu, TW;
Inventors:
Hung-Ting Pan, Pingtung County, TW;
Ken Wu, Hsinchu County, TW;
Luke Hsu, Hsinchu, TW;
Yao-Ching Ku, Hsinchu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
System and method for providing a passivation layer for a phase shift mask ('PSM') are described. In one embodiment, a PSM comprises a transparent substrate; a phase shift pattern disposed on the transparent substrate; and a passivation layer disposed to substantially cover exposed surfaces of at least a portion of the phase shift pattern.