Hung-Ting Pan

Title: Innovations of Inventor Hung-Ting Pan

Introduction

Hung-Ting Pan is a notable inventor based in Pingtung, Taiwan. He has made significant contributions to the field of lithography and semiconductor manufacturing. With a total of 2 patents, his work has advanced the technology used in the production of integrated circuits.

Latest Patents

Hung-Ting Pan's latest patents include a method for lithography patterning that utilizes a single photoresist approach. This method involves coating a resist layer on a substrate, exposing it using a lithography tool with a numerical aperture tuned between about 0.5 and about 0.6, and performing a series of developing processes. His second patent describes a system and method for providing a passivation layer for a phase shift mask (PSM), which includes a transparent substrate and a phase shift pattern.

Career Highlights

Hung-Ting Pan is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this company has allowed him to contribute to cutting-edge technologies in semiconductor fabrication.

Collaborations

He has collaborated with notable coworkers such as Ken Wu and Luke Hsu, further enhancing the innovative environment at his workplace.

Conclusion

Hung-Ting Pan's contributions to the field of semiconductor manufacturing through his patents and collaborations highlight his role as a key innovator in the industry. His work continues to influence advancements in lithography and integrated circuit production.