The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 15, 2014
Filed:
Sep. 18, 2009
Hung-ting Pan, Pingtung, TW;
Jing-huan Chen, Jiandong Township, Pingtung County, TW;
Wei-chung MA, Tainan, TW;
Hsin-chun Chiang, Shanhua Township, Tainan County, TW;
Po-chung Cheng, Zhongpu Shiang, TW;
Szu-an Wu, Tainan, TW;
Hung-Ting Pan, Pingtung, TW;
Jing-Huan Chen, Jiandong Township, Pingtung County, TW;
Wei-Chung Ma, Tainan, TW;
Hsin-Chun Chiang, Shanhua Township, Tainan County, TW;
Po-Chung Cheng, Zhongpu Shiang, TW;
Szu-An Wu, Tainan, TW;
Taiwan Semiconductor Manufacturing Company, Ltd., Hsin-Chu, TW;
Abstract
A method of lithography patterning includes coating a resist layer on a substrate; performing an exposing process to the resist layer using a lithography tool with a numerical aperture tuned between about 0.5 and about 0.6; baking the resist layer; thereafter performing a first developing process to the resist layer for a first period of time; and performing a second developing process to the resist layer for a second period of time.