This inventor holds 1 USPTO granted patent. Top assignee: Taiwan Semiconductor Manufacturing Comp. Ltd.. Active years: 2014.
Company Filing History:
Years Active: 2014
Title: Innovations of Wei-Chung Ma in Lithography Technology
Introduction
Wei-Chung Ma is a notable inventor based in Tainan, Taiwan. He has made significant contributions to the field of lithography, particularly through his innovative approaches to photoresist technology. His work is essential for advancements in semiconductor manufacturing.
Latest Patents
Wei-Chung Ma holds a patent for a method titled "Single photoresist approach for high challenge photo process." This patent describes a lithography patterning method that includes several steps: coating a resist layer on a substrate, exposing the resist layer using a lithography tool with a numerical aperture tuned between about 0.5 and about 0.6, baking the resist layer, and performing both a first and a second developing process for specified periods of time. This innovative approach enhances the efficiency and effectiveness of lithography processes.
Career Highlights
Wei-Chung Ma is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His work at this prestigious company allows him to apply his innovative ideas in a practical setting, contributing to the advancement of technology in the semiconductor field.
Collaborations
Throughout his career, Wei-Chung Ma has collaborated with talented individuals such as Hung-Ting Pan and Jing-Huan Chen. These collaborations have fostered a creative environment that encourages innovation and the development of new technologies.
Conclusion
Wei-Chung Ma's contributions to lithography technology through his patent and work at Taiwan Semiconductor Manufacturing Company Limited highlight his role as an influential inventor in the semiconductor industry. His innovative methods continue to shape the future of lithography processes.