Company Filing History:
Years Active: 2010-2014
Title: Innovations by Inventor Luke Hsu
Introduction
Luke Hsu is a prominent inventor based in Hsinchu, Taiwan. He has made significant contributions to the field of photomask technology, holding a total of 3 patents. His work focuses on enhancing the performance and efficiency of photomasks used in semiconductor manufacturing.
Latest Patents
One of his latest patents is titled "Photomask and photomask substrate with reduced light scattering properties." This invention provides a mask substrate and photomask that includes a substantially light transparent substrate with a circuitry pattern. The circuitry pattern features a phase shifting layer and a substantially light shielding layer, which is crucial for improving the quality of photolithography processes. Another notable patent is the "Method for forming a robust mask with reduced light scattering." This method involves a series of steps including photolithographic patterning, forming a light shielding layer, and etching processes to create a high-quality mask.
Career Highlights
Luke Hsu is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise in photomask technology has positioned him as a valuable asset to the company, contributing to advancements in semiconductor manufacturing processes.
Collaborations
Luke has collaborated with notable colleagues such as Ken Wu and Hung-Chang Hsieh. Their combined efforts in research and development have led to innovative solutions in the field of semiconductor technology.
Conclusion
Luke Hsu's contributions to photomask technology and his innovative patents demonstrate his commitment to advancing the semiconductor industry. His work continues to influence the development of more efficient manufacturing processes.