Annaka, Japan

Ken Aihara

This inventor holds 12 USPTO granted patents and 2 EPO patents. Top assignee: Shin-Etsu Handotai Co., Ltd.. Active years: 1996-2010.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Ken Aihara. Retrieved from https://idiyas.com/inventor/ken-aihara

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

 

Average Co-Inventor Count = 3.2

ph-index = 6

Forward Citations = 171(Granted Patents)


Location History:

  • Gunma-ken, JP (2000 - 2001)
  • Gunma, JP (2003 - 2007)
  • Annaka, JP (1996 - 2010)

Company Filing History:


Years Active: 1996-2010

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12 patents (USPTO):Explore Patents

Title: Ken Aihara: Innovator in Silicon Wafer Manufacturing

Introduction

Ken Aihara is a distinguished inventor based in Annaka, Japan, renowned for his significant contributions to the field of silicon wafer manufacturing. With a portfolio of 12 patents, Ken has made remarkable advancements that enhance the quality and efficiency of silicon epitaxial layers.

Latest Patents

Among his latest inventions is a novel method for manufacturing silicon epitaxial wafers. This technique involves the growth of a silicon epitaxial layer in the vapor phase on a silicon single crystal substrate produced by the Czochralski method. By doping the silicon with boron, he achieves a resistivity of 0.02 Ω·cm or below. The process includes the formation of oxygen precipitation nuclei through annealing in an oxidizing atmosphere at temperatures ranging from 450°C to 750°C. This innovative method ensures that the final thickness of the silicon oxide film remains minimal, equivalent to a native oxide layer, and eliminates the need for hydrofluoric acid cleaning.

Another of Ken's significant patents outlines a method of producing annealed wafers. His approach utilizes a silicon single crystal wafer with a diameter exceeding 200 mm and involves high-temperature heat treatment in an atmosphere of argon and hydrogen gases at temperatures between 1100°C and 1350°C. Ken introduces a pre-annealing step at lower temperatures to suppress slip dislocation growth, effectively reducing defect density on the wafer’s surface layer, especially in larger diameters.

Career Highlights

Ken Aihara works at Shin-Etsu Handotai Co., Ltd., a leading company in the field of semiconductor materials and technologies. His career has been marked by ongoing innovation, pushing the boundaries of what is possible in silicon wafer production.

Collaborations

Throughout his career, Ken has collaborated with esteemed colleagues, including Hiroshi Takeno and Yoshinori Hayamizu. These partnerships have fostered a dynamic environment for creativity and innovation within their research endeavors.

Conclusion

Ken Aihara stands out as an influential inventor whose work has significantly impacted the semiconductor industry. Through his innovative patents and collaborations at Shin-Etsu Handotai Co., Ltd., Ken continues to contribute to advancements in silicon wafer manufacturing, showcasing the vital role of inventors in driving technological progress.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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