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For the Inventor, By the Inventor

Kumamoto, Japan

Keisuke Sasaki

This inventor holds 6 USPTO granted patents and 1 published patent application. Top assignee: Tokyo Electron Limited. Active years: 2013-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Keisuke Sasaki. Retrieved from https://idiyas.com/inventor/keisuke-sasaki-nedw8e37

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 6 

% Patents Active = 100.0

Average Co-Inventor Count = 3.5

ph-index = 1


Location History:

  • Tosu, JP (2013)
  • Koshi, JP (2020)
  • Kumamoto, JP (2021)

Company Filing History:

goldMedal6 out of 10,918 
 
Tokyo Electron Limited
 patents

Years Active: 2013-2026

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6 patents (USPTO):Explore Patents
1. 12690414 - Substrate holder, substrate processing system, and substrate transfer method (2026-07-21),
2. 12557591 - Linearly moving mechanism and method of suppressing particle scattering (2026-02-17),
3. 12444622 - Substrate processing system and substrate processing method (2025-10-14),
4. 11211278 - Substrate processing apparatus and substrate processing method (2021-12-28),
5. 10591823 - Substrate processing apparatus and substrate processing method (2020-03-17),
6. 8408234 - Process liquid supply system, process liquid supply method, and storage medium (2013-04-02),

Title: Keisuke Sasaki: Innovator in Substrate Processing Technology

Introduction

Keisuke Sasaki is a prominent inventor based in Kumamoto, Japan. He has made significant contributions to the field of substrate processing technology, holding a total of 6 patents. His work focuses on improving the efficiency and effectiveness of substrate processing systems.

Latest Patents

Sasaki's latest patents include a substrate processing system and a substrate processing method. The substrate processing system features a carry-in/out section for cassettes that accommodate multiple substrates. It also includes a batch processing section for collective processing of wafer lots and a single-wafer processing section for individual substrate processing. The interface section facilitates the delivery of substrates between the batch and single-wafer processing sections.

Another notable patent is the substrate processing apparatus, which consists of a storage part for substrate accommodation containers and a first transfer device for delivering these containers to a loading/unloading part. This innovative design enhances the loading and unloading processes within the substrate processing apparatus.

Career Highlights

Keisuke Sasaki is currently employed at Tokyo Electron Limited, a leading company in the semiconductor manufacturing equipment industry. His work at the company has allowed him to develop cutting-edge technologies that are essential for modern substrate processing.

Collaborations

Sasaki has collaborated with notable coworkers, including Akihiro Teramoto and Suguru Enokida. Their combined expertise has contributed to the advancement of substrate processing technologies.

Conclusion

Keisuke Sasaki's innovative work in substrate processing technology has led to several patents that enhance the efficiency of semiconductor manufacturing. His contributions continue to impact the industry positively.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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