Keiki Ito

This inventor holds 8 USPTO granted patents. Top assignees: Tokyo Electron Limited, Ckd Corporation. Active years: 1996-2018.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Keiki Ito. Retrieved from https://idiyas.com/inventor/keiki-ito

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 8

% Patents Active = 87.5

Average Co-Inventor Count = 5.0

ph-index = 4

Forward Citations = 122(Granted Patents)

Location History:

Yamanashi, JP (2009 - 2012)
Nirasaki, JP (1996 - 2016)
Miyagi, JP (2018)

Company Filing History:

8 out of 10,904

Tokyo Electron Limited

where one patent can have more than one assignee

Years Active: 1996-2018

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8 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 10074519 - Plasma processing apparatus and filter unit (2018-09-11),

2. 10056230 - Power supply system, plasma processing apparatus and power supply control method (2018-08-21),

3. 9441791 - Gas supply unit, substrate processing apparatus and supply gas setting method (2016-09-13),

4. 8906193 - Gas supply unit, substrate processing apparatus and supply gas setting method (2014-12-09),

5. 8109288 - Flow rate control system and shower plate used for partial pressure control system (2012-02-07),

6. 7481240 - Partial pressure control system, flow rate control system and shower plate used for partial pressure control system (2009-01-27),

7. 7353841 - Relative pressure control system and relative flow control system (2008-04-08),

8. 5554249 - Magnetron plasma processing system (1996-09-10),

Title: Keiki Ito: Innovator in Plasma Processing Technology

Introduction

Keiki Ito is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of plasma processing technology, holding a total of 8 patents. His innovative work has advanced the efficiency and effectiveness of plasma processing systems.

Latest Patents

Among his latest patents is a plasma processing apparatus and filter unit. This invention provides a plasma processing apparatus where an external circuit is electrically connected to a predetermined electric member within a processing container. The design includes a filter that attenuates or blocks noises from high-frequency waves, ensuring optimal performance. Another notable patent is a power supply system that includes a high-frequency power supply and a DC power supply. This system is designed to control the supply of power efficiently, alternating between high-frequency and DC voltages to enhance the processing capabilities.

Career Highlights

Keiki Ito has worked with notable companies such as Tokyo Electron Limited and CKD Corporation. His experience in these organizations has allowed him to refine his skills and contribute to groundbreaking technologies in the field of plasma processing.

Collaborations

Throughout his career, Keiki Ito has collaborated with talented individuals, including Hideki Nagaoka and Hiroki Endo. These collaborations have fostered innovation and have led to the development of advanced technologies in plasma processing.

Conclusion

Keiki Ito's contributions to plasma processing technology are noteworthy, with multiple patents that reflect his innovative spirit. His work continues to influence the industry and pave the way for future advancements.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]