The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 10, 1996
Filed:
Feb. 28, 1995
Makoto Hasegawa, Kawasaki, JP;
Tsuyoshi Saito, Tokyo, JP;
Fumihiko Higuchi, Tokyo, JP;
Hideaki Amano, Zama, JP;
Katsunori Naitoh, Yamanashi-ken, JP;
Takashi Tozawa, Yamanashi-ken, JP;
Tatsuya Nakagome, Yamanashi-ken, JP;
Keiki Ito, Nirasaki, JP;
Kouji Suzuki, Yamanashi-ken, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A magnetron plasma etching system has a plurality of processing chambers connected to a common transfer chamber. Each processing chamber has a pair of counter electrodes for generating an electric field and a magnet mechanism for generating a magnetic field having an N-S axis crossing the electric field. All magnetic fields are rotated in the same plane. The rotation of the magnetic fields is controlled by a controller. When one of the magnetic fields is rotated, the other magnetic fields are rotated at equal speed such that the directions of N-S axes thereof are parallel and identical to that of the one of the magnetic fields.