Keh-Wen Chang

Title: Innovations of Keh-Wen Chang

Introduction

Keh-Wen Chang is a notable inventor based in Miaoli County, Taiwan. He has made significant contributions to the field of semiconductor manufacturing, holding a total of 4 patents. His work focuses on improving processes and technologies that enhance the efficiency and effectiveness of semiconductor devices.

Latest Patents

One of Keh-Wen Chang's latest patents is titled "Treatment to interface between metal film and BARC or photoresist." This patent discloses a method of manufacturing a semiconductor device, where a metallic layer is formed over a substrate, treated with an alkaline solution, and subsequently coated with a bottom anti-reflective coating (BARC) layer. Another significant patent is the "Method and system for feed-forward advanced process control." This invention outlines a method for forming a new integrated circuit design on a semiconductor wafer using a photolithography tool. It involves selecting a previously processed wafer, extracting critical dimension data points, and refining exposure dose maps to ensure accurate circuit design.

Career Highlights

Keh-Wen Chang is currently employed at Taiwan Semiconductor Manufacturing Company Limited, a leading firm in the semiconductor industry. His expertise and innovative approaches have contributed to advancements in semiconductor technology, making him a valuable asset to his company.

Collaborations

Keh-Wen Chang has collaborated with several talented individuals, including Chih-Jen Yu and Chun-Hung Lin. These collaborations have fostered a creative environment that encourages the development of groundbreaking technologies in semiconductor manufacturing.

Conclusion

Keh-Wen Chang's contributions to the semiconductor industry through his patents and collaborative efforts highlight his role as an influential inventor. His work continues to shape the future of semiconductor technology, demonstrating the importance of innovation in this critical field.