The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 21, 2009
Filed:
Apr. 02, 2007
Applicants:
Keh-wen Chang, Miaoli County, TW;
Jun-ren Chen, Jhubei, TW;
Inventors:
Keh-Wen Chang, Miaoli County, TW;
Jun-Ren Chen, Jhubei, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Hsin-Chu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/00 (2006.01); G01B 9/00 (2006.01); G01N 21/00 (2006.01); G03B 27/32 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
The present disclosure provides a method for measuring lens contamination in a lithography apparatus. The method includes imaging an asymmetric pattern utilizing a lens system and measuring an alignment offset of the asymmetric pattern associated with the lens system. A contamination of the lens system is determined by comparing the alignment offset to a reference value.
Chang, Keh-Wen. (2009). Method and apparatus for lens contamination control (U.S. Patent No. 7564556). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7564556
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile