This inventor holds 27 USPTO granted patents and 8 published patent applications and 7 EPO patents, primarily in EUV Lithography. Top assignees: Asahi Glass Company, Limited, Nec Corporation. Active years: 2010-2026.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile
Location History:
- Yokohama, JP (2014)
- Tokyo, JP (2010 - 2015)
- Chiyoda-ku, JP (2010 - 2018)
Company Filing History:
Years Active: 2010-2026
Areas of Expertise:
Title: Innovations by Kazuyuki Hayashi: A Pioneer in Reflective Mask Technology
Introduction: Kazuyuki Hayashi, located in Chiyoda-ku, Japan, has made significant contributions to the field of lithography through his innovative inventions. With a remarkable portfolio of 22 patents, Hayashi has established himself as a leading inventor in the area of reflective mask technology.
Latest Patents: Hayashi's latest patents include groundbreaking developments such as the "Reflective Mask Blank and Process for Producing the Reflective Mask Blank." This invention features a reflective mask blank comprising a substrate, a reflective multilayer film designed to reflect exposure light, and an absorber layer for absorbing the exposure light. This innovative mask blank has fiducial marks with concave portions, specifically designed for improved accuracy in EUV lithography applications. Another notable patent is for a "Reflective Mask Blank for EUV Lithography," which involves a substrate with a conductive film. This unique design enhances the production quality of reflective mask blanks while ensuring precise control over the film thickness.
Career Highlights: Hayashi has been a vital part of Asahi Glass Company, Limited, where he applies his expertise in materials science and engineering. His tenure at this leading company has allowed him to work on cutting-edge technologies essential for advancements in the semiconductor industry.
Collaborations: Throughout his career, Kazuyuki Hayashi has collaborated with notable coworkers, including Takashi Sugiyama and Toshiyuki Uno. These collaborations have enabled him to leverage diverse perspectives and skills, fostering innovation and the successful development of complex technologies in his field.
Conclusion: Kazuyuki Hayashi's contributions through his patents have significantly impacted the technological landscape of lithography and reflective masks. His work serves as a testament to the importance of innovation in driving progress within the semiconductor industry, positioning him as a key figure in the realm of modern inventions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile