Tamano, Japan

Kazutoshi Murata

USPTO Granted Patents = 7 

 

Average Co-Inventor Count = 3.0

ph-index = 4

Forward Citations = 20(Granted Patents)


Location History:

  • Okayama, JP (2012 - 2013)
  • Tamano, JP (2006 - 2015)

Company Filing History:


Years Active: 2006-2015

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7 patents (USPTO):Explore Patents

Title: Kazutoshi Murata: Innovator in Atomic Layer Deposition Technology

Introduction

Kazutoshi Murata is a talented inventor based in Tamano, Japan, known for his significant contributions to the field of thin film technology. With a total of seven patents to his name, Murata has made notable strides in the development of atomic layer deposition (ALD) apparatus, enhancing the capabilities of substrate thin film formation.

Latest Patents

Murata's latest inventions showcase his expertise in atomic layer deposition. One of his patents details an atomic layer deposition apparatus for forming a thin film on a substrate. This apparatus includes a first container with a defined inner space and a second canister-shaped container inside that first container, specifically designed for effective thin film formation. The setup allows for the source gas to enter the second inner space via a first opening, along with a pressing mechanism that ensures optimal separation from the first inner space.

Another patent from Murata introduces a sophisticated atomic layer deposition apparatus that further enhances thin film formation. This design incorporates port functionalities for substrate entry and gas introduction at separate locations. The innovation enables the precise movement of the second container to synchronize with the substrate carrying process and the gas introduction for thin film deposition.

Career Highlights

Throughout his career, Kazutoshi Murata has demonstrated a keen aptitude for engineering and innovation. He has held positions at notable companies such as Mitsui Engineering and Shipbuilding Company Limited and Mitsui Engineering & Shipbuilding. His work at these firms significantly contributed to his understanding of industrial applications and laid the groundwork for his patent developments.

Collaborations

Murata has collaborated with esteemed professionals in his field, including Naomasa Miyatake and Hiroyuki Tachibana. Their combined efforts have undoubtedly advanced the research and applications of atomic layer deposition and related technologies, highlighting Murata's dedication to innovation through teamwork.

Conclusion

Kazutoshi Murata stands out as a prolific inventor focused on advancing atomic layer deposition technology. His patents not only reflect his expertise but also contribute significantly to the field of material science. As he continues to innovate and collaborate, Murata’s work will likely have lasting impacts on industries reliant on thin film technologies.

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