San Jose, CA, United States of America

Kaushal Gangakhedkar

This inventor holds 29 USPTO granted patents and 5 published patent applications and 1 EPO patent, primarily in Semiconductor Processing. Top assignees: Applied Materials, Inc., Photon Dynamics, Inc.. Active years: 2008-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kaushal Gangakhedkar. Retrieved from https://idiyas.com/inventor/kaushal-gangakhedkar

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank
USPTO Granted Patents = 29 

% Patents Active = 93.1

 

Average Co-Inventor Count = 2.9

ph-index = 5

Forward Citations = 94(Granted Patents)


Company Filing History:


Years Active: 2008-2025

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Areas of Expertise:
Rotary Reactor
Particle Coating
Semiconductor Processing
ALD Technology
Wafer Chucking
Ceramic Coatings
Temperature Monitoring
Carousel Susceptor
Aerospace Components
Plasma Spray
Integrated Motor
Gap Control
29 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Kaushal Gangakhedkar

Introduction

Kaushal Gangakhedkar, based in San Jose, CA, is a prolific inventor with an impressive portfolio of 28 patents. His inventions primarily focus on advancements in semiconductor processing and particle coating technologies, showcasing his expertise and innovative mindset in the field of engineering.

Latest Patents

Two of his notable recent patents include:

1. **Apparatus and Methods for Semiconductor Processing** - This patent describes apparatus and methods specifically designed for processing semiconductor wafers. The innovation ensures that the wafer remains securely in place by creating a pressure differential between its top and bottom surfaces, preventing any movement during processing. The mechanism involves applying decreased pressure to the back side of the wafer, which stabilizes its position.

2. **Particle Coating Methods and Apparatus** - This invention details a reactor for efficient coating of particles. It includes a vacuum chamber to hold particles, with a vacuum port that exhausts gas through the chamber outlet. A chemical delivery system enables the flow of process gas into the chamber, while vibrational actuators create sufficient vibrational motion to ensure comprehensive coating of the particles.

Career Highlights

Throughout his career, Kaushal has worked with leading companies in the technology sector, including Applied Materials, Inc. and Photon Dynamics, Inc. His contributions in these organizations have been instrumental in the development of cutting-edge technologies in semiconductor processing.

Collaborations

Kaushal has collaborated with notable professionals in his field, including Joseph Yudovsky and Pravin K. Narwankar. These collaborations have likely fostered innovative solutions and advancements in technology, further highlighting Kaushal's integral role in the research and development community.

Conclusion

Kaushal Gangakhedkar stands out as an influential inventor in the realm of semiconductor technologies and particle coating methods. His extensive patent portfolio and collaborative efforts underscore his commitment to innovation and excellence. As technology continues to evolve, the contributions made by inventors like Kaushal will play a significant role in shaping the future of the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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