The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 24, 2023

Filed:

Jun. 03, 2022
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Yuriy Melnik, San Jose, CA (US);

Sukti Chatterjee, San Jose, CA (US);

Kaushal Gangakhedkar, San Jose, CA (US);

Jonathan Frankel, Los Gatos, CA (US);

Lance A. Scudder, Sunnyvale, CA (US);

Pravin K. Narwankar, Sunnyvale, CA (US);

David Alexander Britz, Los Gatos, CA (US);

Thomas Knisley, Livonia, MI (US);

Mark Saly, Santa Clara, CA (US);

David Thompson, San Jose, CA (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
F01D 5/28 (2006.01); C23C 16/455 (2006.01); C23C 16/34 (2006.01); C23C 16/40 (2006.01); C23C 16/30 (2006.01); C23C 16/56 (2006.01); F01D 9/02 (2006.01); F01D 25/12 (2006.01); F01D 25/28 (2006.01); F23R 3/28 (2006.01); C07F 11/00 (2006.01); F01D 25/14 (2006.01);
U.S. Cl.
CPC ...
F01D 5/288 (2013.01); C23C 16/30 (2013.01); C23C 16/34 (2013.01); C23C 16/405 (2013.01); C23C 16/45529 (2013.01); C23C 16/45553 (2013.01); C23C 16/45555 (2013.01); C23C 16/56 (2013.01); F01D 5/286 (2013.01); F01D 9/02 (2013.01); F01D 25/12 (2013.01); F01D 25/28 (2013.01); F23R 3/28 (2013.01); C07F 11/005 (2013.01); F01D 25/145 (2013.01); F05D 2230/314 (2013.01);
Abstract

Methods for forming protective coatings on aerospace components are provided. In one or more embodiments, the method includes exposing an aerospace component to a first precursor and a first reactant to form a first deposited layer on a surface of the aerospace component by a first deposition process (e.g., CVD or ALD), and exposing the aerospace component to a second precursor and a second reactant to form a second deposited layer on the first deposited layer by a second deposition process. The first deposited layer and the second deposited layer have different compositions from each other. The method also includes repeating the first deposition process and the second deposition process to form a nanolaminate film stack having from 2 pairs to about 1,000 pairs of the first deposited layer and the second deposited layer consecutively deposited on each other.


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