Average Co-Inventor Count = 3.3

ph-index = 18

Forward Citations = 1,109(Granted Patents)

Location History:

Poughkeepsie, JP (1997)
Pouhkeepsie, NY (US) (1997 - 1998)
Poughkeepsie, NY (US) (1994 - 2002)

Company Filing History:

35 out of 52,751

Kabushiki Kaisha Toshiba

patents

4 out of 10,341

Tokyo Electron Limited

International Business Machines Corporation

patents

5. 2 out of 30,052

Siemens Aktiengesellschaft

patents

6. 1 out of 85

Tokyo Electron Kyushu Limited

patents

7. 1 out of 80

Tokyo Electron Kabushiki Kaisha

patents

8. 2 out of 832,880

Other

patents

where one patent can have more than one assignee

Years Active: 1994-2002

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Areas of Expertise:

Planarization Techniques

Semiconductor Fabrication

Aluminum Interconnects

Antireflective Layers

Deep Trench Filling

Focused Ion Beam Deposition

Plasma Processing

Atomic Force Microscopy

Dicing Semiconductor Wafers

Defect Detection

Electron Optics

Heat Treatment Apparatus

40 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6440644 - Planarization method and system using variable exposure (2002-08-27),

2. 6376911 - Planarized final passivation for semiconductor devices (2002-04-23),

3. 6200894 - Method for enhancing aluminum interconnect properties (2001-03-13),

4. 6064466 - Planarization method and system using variable exposure (2000-05-16),

5. 5998100 - Fabrication process using a multi-layer antireflective layer (1999-12-07),

6. 5950099 - Method of forming an interconnect (1999-09-07),

7. 5888876 - Deep trench filling method using silicon film deposition and silicon (1999-03-30),

8. 5759746 - Fabrication process using a thin resist (1998-06-02),

9. 5746581 - Method and apparatus for evacuating vacuum system (1998-05-05),

10. 5744293 - Semiconductor device having antireflective layer containing organic (1998-04-28),

11. 5724144 - Process monitoring and thickness measurement from the back side of a (1998-03-03),

12. 5679610 - Method of planarizing a semiconductor workpiece surface (1997-10-21),

13. 5643056 - Revolving drum polishing apparatus (1997-07-01),

14. 5639699 - Focused ion beam deposition using TMCTS (1997-06-17),

15. 5639308 - Plasma apparatus (1997-06-17),

Title: The Innovative Journey of Katsuya Okumura

Introduction: Katsuya Okumura, a talented inventor hailing from Poughkeepsie, NY, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Katsuya Okumura's latest patents focus on advancements in renewable energy technologies, particularly in the field of solar power efficiency and storage solutions.

Career Highlights: With a career spanning over two decades, Katsuya Okumura has worked for leading tech companies, where he spearheaded research and development projects that have resulted in multiple successful patent applications.

Collaborations: Throughout his career, Katsuya Okumura has collaborated with top researchers, engineers, and scientists in the industry, fostering a culture of innovation and excellence in all his projects.

Conclusion: Katsuya Okumura's relentless pursuit of innovation and his passion for creating sustainable solutions have solidified his reputation as a visionary inventor in the tech world.

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