IDiyas

For the Inventor, By the Inventor

Saitama, Japan

Katsumi Ogi

USPTO Granted Patents = 30

Average Co-Inventor Count = 3.8

ph-index = 8

Forward Citations = 204(Granted Patents)


Location History:

  • Omiya, JP (1993 - 2002)
  • Saitama, JP (1984 - 2003)
  • Ohmiya, JP (2001 - 2005)
  • Minami-saitama-gun, JP (2006)
  • Naka-gun, JP (2006)

Company Filing History:

goldMedal26 out of 1,530 
 
Mitsubishi Materials Corporation
 patents
silverMedal6 out of 131 
 
Symetrix Corporation
 patents
bronzeMedal3 out of 197 
 
Mitsubishi Kinzoku Kabushiki Kaisha
 patents
4. 1 out of 832,680 
Other
 patents
where one patent can have more than one assignee

Years Active: 1984-2006

Loading Chart...
30 patents (USPTO):Explore Patents
1. 7045645 - Ruthenium compounds, process for their preparation, and ruthenium-containing thin films made by using the compounds (2006-05-16),
2. 6987197 - Organozirconium composite and method of synthesizing the same, raw material solution containing the same, and method of forming lead zirconate titanate thin film (2006-01-17),
3. 6855751 - Silica powder and method for producing the same (2005-02-15),
4. 6569922 - Silica powder and method for producing the same (2003-05-27),
5. 6521770 - Organozirconium compound, organic solution comprising same, and zirconium-containing thin film therefrom (2003-02-18),
6. 6485554 - Solution raw material for forming composite oxide type dielectric thin film and dielectric thin film (2002-11-26),
7. 6355097 - Organic titanium compound suitable for MOCVD (2002-03-12),
8. 6310228 - Organic copper compound, liquid mixture containing the compound, and copper thin-film prepared using the solution (2001-10-30),
9. 6280518 - Organic titanium compound suitable for MOCVD (2001-08-28),
10. 6203608 - Ferroelectric thin films and solutions: compositions (2001-03-20),
11. 6051858 - Ferroelectric/high dielectric constant integrated circuit and method of (2000-04-18),
12. 6022669 - Method of fabricating an integrated circuit using self-patterned thin (2000-02-08),
13. 5942376 - Shelf-stable liquid metal arylketone alcoholate solutions and use (1999-08-24),
14. 5849465 - Photosensitive titanium carboxydiketonate and titanium carboxyketoester (1998-12-15),
15. 5833745 - Bi-based ferroelectric composition and thin film, method for forming the (1998-11-10),

Title: Innovations of Katsumi Ogi in Ruthenium Compounds and Organozirconium Composites

Introduction

Katsumi Ogi is an esteemed inventor based in Saitama, Japan. He holds a remarkable portfolio of 30 patents, showcasing his expertise in the field of materials science, particularly in the development of ruthenium compounds and organozirconium composites.

Latest Patents

Katsumi Ogi's most recent patents encompass significant advancements in chemical compounds. One of his notable innovations is a series of ruthenium compounds designed for metalorganic chemical vapor deposition (MOCVD). This includes a bis(cyclopentadienyl)ruthenium complex with specified low content of impurities, suitable for creating ruthenium-containing thin films. Furthermore, he has provided an improved organozirconium composite and methods for synthesizing it, which enable precise control over the composition of lead zirconate titanate (PZT) thin films. His work also ensures stability by minimizing reactions with organolead compounds, thus preventing vapor phase cracking during the formation of these materials.

Career Highlights

Throughout his career, Katsumi has made substantial contributions while working with prominent companies such as Mitsubishi Materials Corporation and Symetrix Corporation. His work has pushed the boundaries of chemical engineering and materials science, solidifying his reputation as an inventive leader in his field.

Collaborations

Katsumi has collaborated with other distinguished professionals, including Hiroto Uchida and Nobuyuki Soyama. Together, they have advanced research and development in materials suitable for various industrial applications, emphasizing innovation and practical solutions.

Conclusion

Katsumi Ogi’s innovative contributions to the field of chemical materials through his patents on ruthenium compounds and organozirconium composites demonstrate his significant impact on modern technology. His collaborations and career achievements highlight the importance of teamwork in fostering advancements in science and engineering.

This text is generated by artificial intelligence and may not be accurate.
Please report any incorrect information to support@idiyas.com
Loading…