The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 1999
Filed:
Aug. 14, 1997
Applicant:
Inventors:
Hiroto Uchida, Colorado Springs, CO (US);
Nobuyuki Soyama, Colorado Springs, CO (US);
Kensuke Kageyama, Saitama, JP;
Katsumi Ogi, Saitama, JP;
Michael C Scott, New South Wales, AU;
Larry D McMillan, Colorado Springs, CO (US);
Carlos A Paz de Araujo, Colorado Springs, CO (US);
Assignees:
Symetrix Corporation, Colorado Springs, CO (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D / ;
U.S. Cl.
CPC ...
430330 ; 430198 ; 430311 ; 505440 ; 505445 ; 505734 ; 427 63 ; 427555 ; 427558 ; 427553 ; 65 172 ; 65 175 ;
Abstract
Solution films of a photosensitive metal arylketone alcoholate are micro-patterned by exposure to ultraviolet radiation under a mask. The resultant patterns are developed in an apolar solvent and annealed to provide thin film metal oxides for use in integrated circuits.