Katsuhiko Hotta

Title: The Innovative Journey of Katsuhiko Hotta

Introduction

Katsuhiko Hotta, a prominent inventor based in Tokyo, Japan, has made significant contributions to the field of semiconductor technology. With a remarkable portfolio of 48 patents, Hotta is recognized for his innovative approaches to simplifying manufacturing processes in multilevel Cu interconnects.

Latest Patents

Among his recent patents is a groundbreaking invention focused on semiconductor devices and methods of manufacturing them. This innovation aims to simplify the dual-damascene formation steps typically involved in creating multilevel copper interconnections. Specifically, it eliminates the formation step of an antireflective film placed beneath a photoresist film. The process involves dry etching an interlayer insulating film with a photoresist film acting as a mask, leading to the formation of interconnect trenches. This technique is further enhanced by utilizing a stopper film composed of an SiCN film known for its low optical reflectance, which effectively serves as an antireflective film during the exposure of the photoresist film.

Career Highlights

Katsuhiko Hotta has played an instrumental role at major technology companies, including Renesas Electronics Corporation and Renesas Technology Corporation. His work at these companies has significantly advanced the techniques used in semiconductor manufacturing.

Collaborations

Throughout his career, Hotta has collaborated with esteemed colleagues such as Kyoko Sasahara and Hiroyuki Maruyama. These partnerships have fostered innovative developments and technological advancements in the semiconductor industry.

Conclusion

With 48 patents to his name, Katsuhiko Hotta continues to influence the world of semiconductor technology through his creative inventions and collaborative efforts. His ability to simplify complex manufacturing processes is a testament to his expertise and dedication to innovation.