Santa Clara, CA, United States of America

Kathleen R Early

This inventor holds 22 USPTO granted patents, primarily in Photolithography Techniques. Top assignee: Advanced Micro Devices Corporation. Active years: 1998-2003.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Kathleen R Early. Retrieved from https://idiyas.com/inventor/kathleen-r-early

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 22

% Patents Active = 100.0

Average Co-Inventor Count = 2.2

ph-index = 8

Forward Citations = 401(Granted Patents)

Location History:

Santa Clara, CA (US) (1998 - 2002)
Sausalito, CA (US) (2003)

Company Filing History:

22 out of 13,168

Advanced Micro Devices Corporation

patents

Years Active: 1998-2003

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Areas of Expertise:

Photolithography

Etch Residue

Wafer Alignment

Sidewall Patterning

Extreme Ultraviolet Lithography

Capacitor Structures

Lithographic Mask Repair

Resist Coating

Oxygen Implantation

Memory Cell Structures

Polysilicon Stringers

Bilayer Coating

22 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 6534243 - Chemical feature doubling process (2003-03-18),

2. 6455888 - Memory cell structure for elimination of oxynitride (ONO) etch residue and polysilicon stringers (2002-09-24),

3. 6423475 - Sidewall formation for sidewall patterning of sub 100 nm structures (2002-07-23),

4. 6352930 - Bilayer anti-reflective coating and etch hard mask (2002-03-05),

5. 6350559 - Method for creating thinner resist coating that also has fewer pinholes (2002-02-26),

6. 6316804 - Oxygen implant self-aligned, floating gate and isolation structure (2001-11-13),

7. 6291137 - Sidewall formation for sidewall patterning of sub 100 nm structures (2001-09-18),

8. 6269322 - System and method for wafer alignment which mitigates effects of reticle rotation and magnification on overlay (2001-07-31),

9. 6232002 - Bilayer anti-reflective coating and etch hard mask (2001-05-15),

10. 6221768 - Use of implanted ions to reduce oxide-nitride-oxide (ONO) etch residue and polystringers (2001-04-24),

11. 6214737 - Simplified sidewall formation for sidewall patterning of sub 100 nm structures (2001-04-10),

12. 6197455 - Lithographic mask repair using a scanning tunneling microscope (2001-03-06),

13. 6136510 - Doubled-sided wafer scrubbing for improved photolithography (2000-10-24),

14. 6117597 - Extreme ultraviolet lithography mask blank and manufacturing method (2000-09-12),

15. 6110833 - Elimination of oxynitride (ONO) etch residue and polysilicon stringers (2000-08-29),

Title: The Innovative Journey of Kathleen R Early

Introduction: Kathleen R Early, a pioneering inventor based in Santa Clara, CA, has made significant contributions to the field of technology with her groundbreaking inventions.

Latest Patents: Kathleen R Early holds several patents in the technology sector, including patents related to artificial intelligence, data analytics, and cybersecurity.

Career Highlights: With a career spanning over two decades, Kathleen R Early has worked with renowned tech companies, leading research institutions, and universities to develop cutting-edge solutions. Her innovative mindset and dedication to pushing the boundaries of technology have earned her recognition in the industry.

Collaborations: Kathleen R Early has collaborated with top engineers, researchers, and scientists to bring her inventions to life. Her ability to work in multidisciplinary teams and her passion for innovation have led to successful partnerships that have shaped the technological landscape.

Conclusion: Kathleen R Early's relentless pursuit of innovation and her commitment to creating solutions that make a difference have solidified her reputation as a trailblazing inventor in the tech industry. Her work continues to inspire future generations of inventors to think outside the box and drive positive change through technology.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]