The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2000
Filed:
Feb. 13, 1997
Tho Le La, San Jose, CA (US);
Subramanian N Venkatkrishnan, Sunnyvale, CA (US);
Mark T Ramsbey, Sunnyvale, CA (US);
Jack F Thomas, Palo Alto, CA (US);
Kathleen Regina Early, Santa Clara, CA (US);
Advanced Micro Devices, Inc., Sunnyvale, CA (US);
Abstract
The accuracy of photolithographic processing, particularly in forming small diameter through holes and/or trenches in a dielectric layer, is improved by double-sided scrubbing the wafer prior to photolithography. It was found that particles adhering to the wafer backside resulting from prior processing steps cause inaccurate photolithographic processing, particularly at a submicron level. Double-sided wafer scrubbing removes such adhering particles, thereby improving photolithographic accuracy.