Leutenbach, Germany

Karsten Weber


Average Co-Inventor Count = 5.1

ph-index = 2

Forward Citations = 30(Granted Patents)


Company Filing History:


Years Active: 2002-2005

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2 patents (USPTO):Explore Patents

Title: The Innovative Contributions of Karsten Weber

Introduction

Karsten Weber is a notable inventor based in Leutenbach, Germany. He has made significant contributions to the field of thermal treatment technologies, particularly in the semiconductor industry. With a total of 2 patents, his work focuses on enhancing the efficiency and effectiveness of thermal processing systems.

Latest Patents

Weber's latest patents include a "Device for thermal treatment of substrates" and a "Gas driven rotating susceptor for rapid thermal processing (RTP) system." The first patent aims to reduce the formation of scratches in devices used for thermal treatment of substrates, especially semiconductor substrates. This is achieved through the use of displaceable support elements that enhance the substrate's stability during processing. The second patent introduces an innovative design for an RTP system, where air bearings support a rotating wafer carrying base. This design protects the base from warping due to radiation absorption from the hot wafer, ensuring optimal performance during thermal processing.

Career Highlights

Throughout his career, Karsten Weber has worked with several prominent companies, including Mattson Technology, Inc. and Steag RTP Systems GmbH. His experience in these organizations has allowed him to develop and refine his innovative ideas, contributing to advancements in thermal processing technologies.

Collaborations

Weber has collaborated with notable professionals in his field, including Helmut Aschner and Andreas Hauke. These collaborations have further enriched his work and have led to the development of cutting-edge technologies in thermal treatment.

Conclusion

Karsten Weber's contributions to the field of thermal treatment technologies are significant and impactful. His innovative patents and collaborations highlight his dedication to advancing semiconductor processing techniques. His work continues to influence the industry and pave the way for future innovations.

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