The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2005
Filed:
Jan. 19, 2001
Applicants:
Uwe Kreiser, Ulm, DE;
Karsten Weber, Leutenbach, DE;
Wilfried Lerch, Dornstadt, DE;
Michael Grandy, Senden, DE;
Patrick Schmid, Dornstadt, DE;
Jürgen Niess, Sontheim, DE;
Olgun Altug, Ulm, DE;
Inventors:
Uwe Kreiser, Ulm, DE;
Karsten Weber, Leutenbach, DE;
Wilfried Lerch, Dornstadt, DE;
Michael Grandy, Senden, DE;
Patrick Schmid, Dornstadt, DE;
Jürgen Niess, Sontheim, DE;
Olgun Altug, Ulm, DE;
Assignee:
Steag RTP Systems GmbH, , DE;
Primary Examiner:
Int. Cl.
CPC ...
F27D005/00 ;
U.S. Cl.
CPC ...
Abstract
The aim of the invention is to reduce the formation of scratches in a device for the thermal treatment of substrates, in particular, semiconductor substrates, in a chamber in which the substrate is placed upon support elements. According to the invention, said aim is achieved by means of displaceable support elements.