Kao-Su Huang is a prominent inventor based in Tainan Hsien, Taiwan. He has made significant contributions to the field of semiconductor technology, holding a total of 8 patents. His work focuses on advanced manufacturing techniques that enhance the efficiency and performance of electronic components.

Latest Patents

Huang's latest patents include a method of manufacturing a capacitor deep trench and a method for forming a patterned photoresist layer. The capacitor deep trench patent describes a substrate with an oxide layer and a first nitride-silicon layer, where a pattern poly-silicon layer is etched to create a deep trench opening. This process not only forms the trench but also deepens it, allowing for a conductive layer to be filled in. The second patent outlines a treatment method for the surface of a photoresist layer, utilizing reaction gases such as hydrogen bromide or hydrogen iodide to create a hardened layer over the photoresist surface. This treatment is performed in-situ with the etching step, enhancing the overall manufacturing process.

Career Highlights

Kao-Su Huang is currently employed at United Microelectronics Corporation, a leading company in the semiconductor industry. His innovative approaches and technical expertise have positioned him as a key player in the development of cutting-edge technologies.

Collaborations

Huang has collaborated with notable colleagues, including Wei-Shiau Chen and Ta-Chuan Yeh, contributing to various projects that push the boundaries of semiconductor manufacturing.

Conclusion

Kao-Su Huang's contributions to the field of semiconductor technology through his patents and collaborations highlight his role as an influential inventor. His work continues to impact the industry, paving the way for future innovations.

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