The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 14, 2008
Filed:
Jan. 06, 2005
Treatment method for surface of photoresist layer and method for forming patterned photoresist layer
Applicant:
Kao-su Huang, Yongkang, TW;
Inventor:
Kao-Su Huang, Yongkang, TW;
Assignee:
United Microelectronic Corp., Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B44C 1/22 (2006.01);
U.S. Cl.
CPC ...
Abstract
A treatment method for a surface of a photoresist layer is provided. After forming a patterned photoresist layer over a wafer, a surface treatment step is performed to the photoresist layer by using at least one reaction gas comprising hydrogen bromide or hydrogen iodide to form a hardened layer over the surface of the photoresist layer. Wherein, the surface treatment step and the etching step are in-situ performed.
Huang, Kao-Su. (2008). Treatment method for surface of photoresist layer and method for forming patterned photoresist layer (U.S. Patent No. 7435354). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7435354
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile